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Showing results 8 to 11 of 11
Article
Interfacial modification of amorphous substrates for microcrystalline silicon growth with in situ hydrogen plasma pretreatmentSCIESCOPUS

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, vol. 202, no. 13, page. 2448 - 2453, 2005-10

Article
Microstructure and deposition rate of aluminum thin films from chemical vapor deposition with dimethylethylamine alaneSCIESCOPUS

APPLIED PHYSICS LETTERS, vol. 68, no. 25, page. 3567 - 3569, 1996-06-17

Article
Remote plasma chemical vapour deposition of silicon films at low temperature with H-2 and He plasma gasesSCIESCOPUS

JOURNAL OF PHYSICS D-APPLIED PHYSICS, vol. 32, no. 16, page. 1955 - 1962, 1999-08-21

Article
Synthesis and characterization of UV curable polyvinylsilazaneSCIESCOPUS

ACTA POLYMERICA SINICA, no. 4, page. 350 - 354, 2008-04

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