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Browsing by  AuthorAziz, Jamal
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Article
Effect of ALD Processes on Physical and Electrical Properties of HfO2 Dielectrics for the Surface Passivation of a CMOS Image Sensor Application
SCIE
SCOPUS
IEEE Access, vol. 10, page. 68724 - 68730, 2022-06
Kim, Honggyun
;
Chavan. Vijay D.
;
Aziz, Jamal
;
Ko, Byoungsu
;
Lee, Jae-Sung
;
et al
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