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Browsing by  AuthorKim, Deok-Kee
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Article
Effect of ALD Processes on Physical and Electrical Properties of HfO2 Dielectrics for the Surface Passivation of a CMOS Image Sensor Application
SCIE
SCOPUS
IEEE Access, vol. 10, page. 68724 - 68730, 2022-06
Kim, Honggyun
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Chavan. Vijay D.
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Aziz, Jamal
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Ko, Byoungsu
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Lee, Jae-Sung
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