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Article
Atomic layer deposition of hafnium silicate films using hafnium tetrachloride and tetra-n-butyl orthosilicateSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, vol. 22, no. 4, page. 1285 - 1289, 2004-07

Article
Atomic layer deposition of zirconium silicate films using zirconium tetrachloride and tetra-n-butyl orthosilicateSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, vol. 20, no. 6, page. 2096 - 2100, 2002-11

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