A Photoetching-After-Growth Approach for the Synthesis of Nanocrystal Heterostructures Exhibiting Tunable Dual-Band Emission
SCIE
SCOPUS
- Title
- A Photoetching-After-Growth Approach for the Synthesis of Nanocrystal Heterostructures Exhibiting Tunable Dual-Band Emission
- Authors
- Lim, Sung Jun; Kim, Wonjung; Shin, Seung Koo
- Date Issued
- 2020-01
- Publisher
- WILEY
- Abstract
- Introduced herein is a new strategy for synthesizing sophisticated colloidal semiconductor nanostructures with targeted optical properties by combining a conventional colloidal growth (bottom-up) process and a postgrowth photoetching (top-down) process. To demonstrate the utility of such photoetching-after-growth approach, a complex quantum dot (QD)-quantum rod (QR) dual quantum-confined domain nanocrystal heterostructure (NCH) is engineered which exhibits bright dual-band emission precisely tunable in a broad visible region. (CdSe/CdS)/ZnS/CdSe QD/barrier/multi-QR NCHs consisting of a single CdSe/CdS QD core and multiple CdSe QR branches with a wide-bandgap ZnS barrier between them are prepared through a multistep colloidal growth. The as-synthesized NCHs show a single emission band from QR; however, after photoetching, NCHs begin to display bright dual emission bands, a high-energy emission band from QR in addition to the low-energy emission band from QD. While the QD emission at 586 nm is determined by colloidal growth conditions, that of QR emission is precisely tunable in the 500-585 nm range by quantum-size-selective photoetching using a wavelength-tunable laser. Notably, the QR emission bandwidth decreases to approximate to 20 nm, which is close to that of a single CdSe nanorod, emphasizing a significant quantum-size-focusing effect of the photoetching process.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/101125
- DOI
- 10.1002/admi.201901769
- ISSN
- 2196-7350
- Article Type
- Article
- Citation
- ADVANCED MATERIALS INTERFACES, vol. 7, no. 1, 2020-01
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