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Fabrication of Ultrathin Nb Nanopin Arrays SCIE SCOPUS

Title
Fabrication of Ultrathin Nb Nanopin Arrays
Authors
Son, JYShin, YSShin, YHJang, HM
Date Issued
2011-01
Publisher
ELECTROCHEMICAL SOC INC
Abstract
We report a new fabrication method for the production of ultrathin Nb nanopin arrays on Si substrates using an anodic aluminum oxide nanotemplate combined with wet etching techniques. Each Nb nanopin in the nanopin array has a tip diameter of several nanometers, which was confirmed by tunneling electron microscopy and energy-dispersive spectrometry. The ultrathin Nb nanopins used as electron beam sources exhibit a field-emission current and emission site density higher than seen in previous results. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3532942] All rights reserved.
URI
https://oasis.postech.ac.kr/handle/2014.oak/10138
DOI
10.1149/1.3532942
ISSN
1099-0062
Article Type
Article
Citation
ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 14, no. 3, page. D33 - D35, 2011-01
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장현명JANG, HYUN MYUNG
Div of Advanced Materials Science
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