Mechanism of Spontaneous and Thermally Activated Hole Doping in Graphene on Silica Substrate
- Title
- Mechanism of Spontaneous and Thermally Activated Hole Doping in Graphene on Silica Substrate
- Authors
- KWANGHEE, PARK; RYU, SUNMIN
- Date Issued
- 2019-03-28
- Publisher
- 한국그래핀연구회
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/103212
- Article Type
- Conference
- Citation
- The 6th Korean Symposium on Graphene and 2D Materials, 2019-03-28
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- There are no files associated with this item.
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