Deep Learning for Inverse Problem: Etching-Mask Design
- Title
- Deep Learning for Inverse Problem: Etching-Mask Design
- Authors
- 허현석; 권형철; 이승철
- Date Issued
- 2020-07-21
- Publisher
- PHM Korea
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/104413
- Article Type
- Conference
- Citation
- PHM Korea 2020, 2020-07-21
- Files in This Item:
- There are no files associated with this item.
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