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Cited 32 time in webofscience Cited 33 time in scopus
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dc.contributor.authorLee, KS-
dc.contributor.authorBaik, S-
dc.date.accessioned2015-06-25T02:10:49Z-
dc.date.available2015-06-25T02:10:49Z-
dc.date.created2009-08-11-
dc.date.issued2000-06-01-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000001321en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/10493-
dc.description.abstractStrain relaxation and its effect on domain formation of epitaxial PbTiO3 thin films grown on MgO (001) substrates were investigated as a function of film thickness by two-dimensional reciprocal space mapping using synchrotron x-ray diffraction. Within a few hundreds of angstrom region, it was observed that c-domain abundance, alpha, was critically dependent on film thickness. As the film thickness increased further, alpha was saturated at a value of similar to 0.75. The HK mesh scan on PbTiO3 (100) reflections revealed that directional tilting of a domains with four-fold symmetry began to develop as the film thickness exceeded 650 Angstrom. Thermodynamic equilibrium relief of the coherency strain was evaluated based on Mattews-Blakslee criteria that determine thickness dependent misfit accommodation. This theoretical consideration with experimental results led us to conclude that the unrelaxed residual misfit strain has a significant effect on the domain formation, particularly in the region below the thickness of 1000 Angstrom. (C) 2000 American Institute of Physics. [S0021-8979(00)07109-7].-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF APPLIED PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleThickness dependence of domain formation in epitaxial PbTiO3 thin films grown on MgO (001) substrates-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.373493-
dc.author.googleLee, KSen_US
dc.author.googleBaik, Sen_US
dc.relation.volume87en_US
dc.relation.issue11en_US
dc.relation.startpage8035en_US
dc.relation.lastpage8038en_US
dc.contributor.id10078291en_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.87, no.11, pp.8035 - 8038-
dc.identifier.wosid000087067400066-
dc.date.tcdate2019-01-01-
dc.citation.endPage8038-
dc.citation.number11-
dc.citation.startPage8035-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume87-
dc.contributor.affiliatedAuthorBaik, S-
dc.identifier.scopusid2-s2.0-0038162982-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc28-
dc.type.docTypeArticle-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusHETEROSTRUCTURES-
dc.subject.keywordPlusRELAXATION-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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