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Cited 66 time in webofscience Cited 80 time in scopus
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dc.contributor.authorAhn, KH-
dc.contributor.authorBaik, S-
dc.contributor.authorKim, SS-
dc.date.accessioned2015-06-25T02:11:39Z-
dc.date.available2015-06-25T02:11:39Z-
dc.date.created2009-08-11-
dc.date.issued2002-09-01-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000002850en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/10509-
dc.description.abstractEffects of Ni or Mn doping in (Ba0.5Sr0.5)TiO3 thin films on leakage current behaviors of Pt/(Ba0.5Sr0.5)TiO3/Pt capacitors were investigated. The leakage current level was found to reduce significantly after the doping over a wide range of voltages and temperatures. The leakage current in an undoped capacitor was largely governed by the Fowler-Nordheim tunneling, and its onset voltage was greatly increased in doped capacitors. The suppression of leakage current in doped capacitors appeared to be caused by a widened depletion layer, which decreases the likelihood of tunneling. (C) 2002 American Institute of Physics.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF APPLIED PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleSignificant suppression of leakage current in (Ba,Sr)TiO3 thin films by Ni or Mn doping-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.1495526-
dc.author.googleAhn, KHen_US
dc.author.googleBaik, Sen_US
dc.author.googleKim, SSen_US
dc.relation.volume92en_US
dc.relation.issue5en_US
dc.relation.startpage2651en_US
dc.relation.lastpage2654en_US
dc.contributor.id10078291en_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.92, no.5, pp.2651 - 2654-
dc.identifier.wosid000177548500068-
dc.date.tcdate2019-01-01-
dc.citation.endPage2654-
dc.citation.number5-
dc.citation.startPage2651-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume92-
dc.contributor.affiliatedAuthorBaik, S-
dc.identifier.scopusid2-s2.0-0036732159-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc60-
dc.description.scptc70*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusELECTRICAL-PROPERTIES-
dc.subject.keywordPlusELECTRODES-
dc.subject.keywordPlusINJECTION-
dc.subject.keywordPlusMEMORIES-
dc.subject.keywordPlusBEHAVIOR-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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