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Cited 12 time in webofscience Cited 12 time in scopus
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dc.contributor.authorJAESEOUNG, PARK-
dc.contributor.authorCHADOL, OH-
dc.contributor.authorSON, JUNWOO-
dc.date.accessioned2021-06-01T03:51:59Z-
dc.date.available2021-06-01T03:51:59Z-
dc.date.created2021-03-05-
dc.date.issued2021-02-
dc.identifier.issn2050-7526-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/105337-
dc.description.abstractIonic–electronic coupling in a lattice strongly influences the memory and learning process by synaptic weight update in electrochemical synaptic transistors. In particular, anisotropic crystal symmetry offers a highly anisotropic diffusion process, which leads to facilitated ion migration and efficient coupling in synaptic devices. Here, we report all-solid-state VO2 synaptic transistors in which the proton diffusion under gate bias can be tuned by utilizing different crystal facets in anisotropic VO2 channels. Synaptic weight update (i.e., excitatory post-synaptic current) by a proton (H+) in the VO2 channel was sensitively tuned depending on the empty tunnel alignment of VO2 layers. By emulating synaptic functions using diffusion-pathway-controlled transistors, the alignment of a facile ionic pathway with gating direction increases the retention of H+ in VO2 lattices by locating H+ into the deep regions from the interfaces, and thus strengthens long-term memory in artificial synaptic devices. These results demonstrate that the control of field-driven ionic redistribution guided by crystal anisotropy provides an opportunity to manipulate the learning and forgetting behavior in artificial synaptic devices.-
dc.languageEnglish-
dc.publisherRoyal Society of Chemistry-
dc.relation.isPartOfJournal of Materials Chemistry C-
dc.titleAnisotropic ionic transport-controlled synaptic weight update by protonation in a VO2 transistor-
dc.typeArticle-
dc.identifier.doi10.1039/D0TC05628F-
dc.type.rimsART-
dc.identifier.bibliographicCitationJournal of Materials Chemistry C, v.9, no.7, pp.2521 - 2529-
dc.identifier.wosid000623516700031-
dc.citation.endPage2529-
dc.citation.number7-
dc.citation.startPage2521-
dc.citation.titleJournal of Materials Chemistry C-
dc.citation.volume9-
dc.contributor.affiliatedAuthorJAESEOUNG, PARK-
dc.contributor.affiliatedAuthorCHADOL, OH-
dc.contributor.affiliatedAuthorSON, JUNWOO-
dc.identifier.scopusid2-s2.0-85101819663-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-

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