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Cited 10 time in webofscience Cited 11 time in scopus
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dc.contributor.authorGutkin, MY-
dc.contributor.authorSheinerman, AG-
dc.contributor.authorSmirnov, MA-
dc.contributor.authorArgunova, TS-
dc.contributor.authorJe, JH-
dc.contributor.authorNagalyuk, SS-
dc.contributor.authorMokhov, EN-
dc.date.accessioned2015-06-25T02:15:23Z-
dc.date.available2015-06-25T02:15:23Z-
dc.date.created2010-04-28-
dc.date.issued2009-12-15-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000020718en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/10613-
dc.description.abstractFormation of pores at foreign polytype boundaries in bulk SiC crystals is studied by means of synchrotron radiation phase-sensitive radiography, optical and scanning electron microscopies, and color photoluminescence. It is demonstrated that pores are formed through coalescence of micropipes and extend along the polytype boundaries by means of micropipe absorption. A theoretical model is suggested, which describes the micropipe absorption by an elliptic pore nucleated at the boundary of a foreign polytype inclusion. It is shown that depending on the inclusion distortion, the pore can either be a separate micropipe, or grow up to a certain length, or occupy the whole facet of the inclusion.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF APPLIED PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleMicropipe absorption mechanism of pore growth at foreign polytype boundaries in SiC crystals-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.3266677-
dc.author.googleGutkin, MYen_US
dc.author.googleSheinerman, AGen_US
dc.author.googleMokhov, ENen_US
dc.author.googleNagalyuk, SSen_US
dc.author.googleJe, JHen_US
dc.author.googleArgunova, TSen_US
dc.author.googleSmirnov, MAen_US
dc.relation.volume106en_US
dc.relation.issue12en_US
dc.relation.startpage123515en_US
dc.relation.lastpage123515en_US
dc.contributor.id10123980en_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.106, no.12, pp.123515 - 123515-
dc.identifier.wosid000273216500023-
dc.date.tcdate2019-01-01-
dc.citation.endPage123515-
dc.citation.number12-
dc.citation.startPage123515-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume106-
dc.contributor.affiliatedAuthorJe, JH-
dc.identifier.scopusid2-s2.0-73849136638-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc4-
dc.description.scptc4*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordAuthorgrain boundaries-
dc.subject.keywordAuthorinclusions-
dc.subject.keywordAuthoroptical microscopy-
dc.subject.keywordAuthorphotoluminescence-
dc.subject.keywordAuthorradiography-
dc.subject.keywordAuthorscanning electron microscopy-
dc.subject.keywordAuthorsilicon compounds-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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제정호JE, JUNG HO
Dept of Materials Science & Enginrg
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