Sub-100 nm and scalable plasmonic lithography using hyperbolic metamaterials and bulk plasmon polariton
- Title
- Sub-100 nm and scalable plasmonic lithography using hyperbolic metamaterials and bulk plasmon polariton
- Authors
- LEE, TAE JUN; RHO, JUN SUK
- Date Issued
- 2020-07-01
- Publisher
- 나노기술연구협의회
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/106217
- Article Type
- Conference
- Citation
- The 18th International Nanotech Symposium & Exhibition (Nano Korea 2020), 2020-07-01
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- There are no files associated with this item.
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