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dc.contributor.authorLEE, BYOUNG HUN-
dc.date.accessioned2023-03-03T02:24:35Z-
dc.date.available2023-03-03T02:24:35Z-
dc.date.created2023-03-03-
dc.date.issued2021-03-23-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/116509-
dc.languageEnglish-
dc.publisherIEEE-
dc.relation.isPartOfIRPS 2021-
dc.titleDrastic reliability improvement using H2O2/UV treatment of HfO2 for heterogeneous integration-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitationIRPS 2021-
dc.citation.conferenceDate2021-03-21-
dc.citation.conferencePlaceUS-
dc.citation.titleIRPS 2021-
dc.contributor.affiliatedAuthorLEE, BYOUNG HUN-
dc.description.journalClass1-
dc.description.journalClass1-

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