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Cited 108 time in webofscience Cited 0 time in scopus
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dc.contributor.authorSong, HJ-
dc.contributor.authorSon, M-
dc.contributor.authorPark, C-
dc.contributor.authorLim, H-
dc.contributor.authorLevendorf, MP-
dc.contributor.authorTsen, AW-
dc.contributor.authorPark, J-
dc.contributor.authorChoi, HC-
dc.date.accessioned2015-06-25T02:50:34Z-
dc.date.available2015-06-25T02:50:34Z-
dc.date.created2012-06-14-
dc.date.issued2012-01-
dc.identifier.issn2040-3364-
dc.identifier.other2015-OAK-0000025572en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/11735-
dc.description.abstractMetal catalyst-free growth of large scale single layer graphene film on a sapphire substrate by a chemical vapor deposition (CVD) process at 950 degrees C is demonstrated. A top-gated graphene field effect transistor (FET) device is successfully fabricated without any transfer process. The detailed growth process is investigated by the atomic force microscopy (AFM) studies.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherROYAL SOC CHEMISTRY-
dc.relation.isPartOfNANOSCALE-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleLarge scale metal-free synthesis of graphene on sapphire and transfer-free device fabrication-
dc.typeArticle-
dc.contributor.college첨단재료과학부en_US
dc.identifier.doi10.1039/C2NR30330B-
dc.author.googleSong, HJen_US
dc.author.googleSon, Men_US
dc.author.googleChoi, HCen_US
dc.author.googlePark, Jen_US
dc.author.googleTsen, AWen_US
dc.author.googleLevendorf, MPen_US
dc.author.googleLim, Hen_US
dc.author.googlePark, Cen_US
dc.relation.volume4en_US
dc.relation.issue10en_US
dc.relation.startpage3050en_US
dc.relation.lastpage3054en_US
dc.contributor.id10104219en_US
dc.relation.journalNANOSCALEen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationNANOSCALE, v.4, no.10, pp.3050 - 3054-
dc.identifier.wosid000303604000009-
dc.date.tcdate2019-01-01-
dc.citation.endPage3054-
dc.citation.number10-
dc.citation.startPage3050-
dc.citation.titleNANOSCALE-
dc.citation.volume4-
dc.contributor.affiliatedAuthorChoi, HC-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc64-
dc.type.docTypeArticle-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusHEXAGONAL BORON-NITRIDE-
dc.subject.keywordPlusELECTRONIC-STRUCTURE-
dc.subject.keywordPlusLARGE-AREA-
dc.subject.keywordPlusEPITAXIAL GRAPHENE-
dc.subject.keywordPlusRAMAN-SPECTROSCOPY-
dc.subject.keywordPlusHIGH-QUALITY-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusFILMS-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-

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