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Cited 15 time in webofscience Cited 18 time in scopus
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dc.contributor.authorLee, S-
dc.contributor.authorWoo, J-
dc.contributor.authorLee, D-
dc.contributor.authorCha, E-
dc.contributor.authorHwang, H-
dc.date.accessioned2015-06-25T02:51:32Z-
dc.date.available2015-06-25T02:51:32Z-
dc.date.created2015-02-26-
dc.date.issued2014-07-25-
dc.identifier.issn1556-276X-
dc.identifier.other2015-OAK-0000032332en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/11765-
dc.description.abstractIn this research, we analyzed the multi-functional role of a tunnel barrier that can be integrated in devices. This tunnel barrier, acting as an internal resistor, changes its resistance with applied bias. Therefore, the current flow in the devices can be controlled by a tunneling mechanism that modifies the tunnel barrier thickness for non-linearity and switching uniformity of devices. When a device is in a low-resistance state, the tunnel barrier controls the current behavior of the device because most of the bias is applied to the tunnel barrier owing to its higher resistance. Furthermore, the tunnel barrier induces uniform filament formation during set operation with the tunnel barrier controlling the current flow.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherSPRINGER-
dc.relation.isPartOfNANOSCALE RESEARCH LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleInternal Resistor of Multi-Functional Tunnel Barrier for Selectivity and Switching Uniformity in Resistive Random Access Memory-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1186/1556-276X-9-364-
dc.author.googleLee, Sen_US
dc.author.googleWoo, Jen_US
dc.author.googleHwang, Hen_US
dc.author.googleCha, Een_US
dc.author.googleLee, Den_US
dc.relation.volume9en_US
dc.relation.startpage364en_US
dc.contributor.id10079928en_US
dc.relation.journalNANOSCALE RESEARCH LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationNANOSCALE RESEARCH LETTERS, v.9, pp.364-
dc.identifier.wosid000340453000001-
dc.date.tcdate2019-01-01-
dc.citation.startPage364-
dc.citation.titleNANOSCALE RESEARCH LETTERS-
dc.citation.volume9-
dc.contributor.affiliatedAuthorHwang, H-
dc.identifier.scopusid2-s2.0-84936773994-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc7-
dc.description.scptc6*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordAuthorReRAM-
dc.subject.keywordAuthorReliability-
dc.subject.keywordAuthorSelectivity-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-

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황현상HWANG, HYUNSANG
Dept of Materials Science & Enginrg
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