DC Field | Value | Language |
---|---|---|
dc.contributor.author | Mishra, Avnish Kumar | - |
dc.contributor.author | Lee, Jaeyong | - |
dc.contributor.author | Kang, Sukwon | - |
dc.contributor.author | Kim, Eunseol | - |
dc.contributor.author | Choi, Chungryong | - |
dc.contributor.author | Kim, Jin Kon | - |
dc.date.accessioned | 2023-07-07T06:20:41Z | - |
dc.date.available | 2023-07-07T06:20:41Z | - |
dc.date.created | 2023-04-25 | - |
dc.date.issued | 2022-12 | - |
dc.identifier.issn | 0024-9297 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/117851 | - |
dc.description.abstract | The self-assembly of block copolymers has potential applications for next-generation lithography with a small feature size of less than 10 nm. Though a feature size of ∼5 nm has been reported, the fabrication of ultra-small feature sizes (less than 5 nm) still remains a great challenge. In this study, we utilized a compound with three hydroxyl groups named gallol, which shows strong intermolecular interactions. We synthesized, via a reversible addition-fragmentation chain-transfer polymerization, a polytrihydroxystyrene-block-polystyrene copolymer (PTHS-b-PS) having lamellar and cylindrical microdomains by adjusting the volume fraction of the PS block (fPS). We found that the Flory-Huggins interaction parameter (χ) between the PTHS and PS segments was extremely large, 1.24 at 220 °C. By using a PTHS-b-PS with a total molecular weight of 1.4 kg mol-1and fPS= 0.53, we obtained a lamellar domain spacing (L0) as small as 4.5 nm. Also, the diameter of hexagonally packed cylinders was reduced to 4.0 nm by employing another PTHS-b-PS with a molecular weight of 2.9 kg mol-1and fPS= 0.74. This ultra-small feature size can be used for next-generation lithography. © 2022 American Chemical Society. All rights reserved. | - |
dc.language | English | - |
dc.publisher | American Chemical Society | - |
dc.relation.isPartOf | Macromolecules | - |
dc.title | Gallol-Based Block Copolymer with a High Flory–Huggins Interaction Parameter for Next-Generation Lithography | - |
dc.type | Article | - |
dc.identifier.doi | 10.1021/acs.macromol.2c01633 | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | Macromolecules, v.55, no.24, pp.10797 - 10803 | - |
dc.identifier.wosid | 000894766000001 | - |
dc.citation.endPage | 10803 | - |
dc.citation.number | 24 | - |
dc.citation.startPage | 10797 | - |
dc.citation.title | Macromolecules | - |
dc.citation.volume | 55 | - |
dc.contributor.affiliatedAuthor | Lee, Jaeyong | - |
dc.contributor.affiliatedAuthor | Kang, Sukwon | - |
dc.contributor.affiliatedAuthor | Kim, Eunseol | - |
dc.contributor.affiliatedAuthor | Choi, Chungryong | - |
dc.contributor.affiliatedAuthor | Kim, Jin Kon | - |
dc.identifier.scopusid | 2-s2.0-85143849099 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.type.docType | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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