DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chung, J. W. | - |
dc.contributor.author | Baek, D. H. | - |
dc.contributor.author | Kim, B. O. | - |
dc.contributor.author | Yeom, H. W. | - |
dc.contributor.author | Kim, C. Y. | - |
dc.contributor.author | Jeong, J. I. | - |
dc.contributor.author | Shin, H. J. | - |
dc.date.accessioned | 2015-06-25T02:57:59Z | - |
dc.date.available | 2015-06-25T02:57:59Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 1992-01-15 | - |
dc.identifier.issn | 1098-0121 | - |
dc.identifier.other | 2015-OAK-0000008546 | en_US |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/11967 | - |
dc.description.abstract | The local atomic-bond structures in amorphous SiO2 films prepared by a nonthermal method have been investigated by electron-energy-loss spectroscopy (EELS). The method utilizes oxygen ions of energy below 600 eV impinging on Si(100) surfaces at room temperature. The results, based on an augmented-central-force model, reveal that the Si-O bond nature in the films strongly resembles a typical thermal SiO2 glass. The contribution of noncentral forces to the local Si-O bonding, in terms of the ratio of noncentral-to-central force constants beta/alpha, is estimated by reducing the low-frequency EELS vibrational band (HBAR less-than-or-equal-to 80 meV). The ratio is found to be rather temperature insensitive but increases with film thickness, in the range 0.13 < beta/alpha < 0.19. We also observe thermally activated migration of oxygen atoms in the films with an activation energy barrier of about 0.22 eV. | - |
dc.description.statementofresponsibility | open | en_US |
dc.language | English | - |
dc.publisher | AMERICAN PHYSICAL SOC | - |
dc.relation.isPartOf | PHYSICAL REVIEW B | - |
dc.rights | BY_NC_ND | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/2.0/kr | en_US |
dc.title | INTERACTION OF LOW-ENERGY OXYGEN IONS WITH THE SI(100) SURFACE | - |
dc.type | Article | - |
dc.contributor.college | 물리학과 | en_US |
dc.identifier.doi | 10.1103/PhysRevB.45.1705 | - |
dc.author.google | Chung, J. W. | en_US |
dc.author.google | Baek, D. H. | en_US |
dc.author.google | Shin, H. J. | en_US |
dc.author.google | Jeong, J. I. | en_US |
dc.author.google | Kim, C. Y. | en_US |
dc.author.google | Yeom, H. W. | en_US |
dc.author.google | Kim, B. O. | en_US |
dc.relation.volume | 45 | en_US |
dc.relation.startpage | 1705 | en_US |
dc.relation.lastpage | 1711 | en_US |
dc.contributor.id | 10052578 | en_US |
dc.relation.journal | PHYSICAL REVIEW B | en_US |
dc.relation.index | SCI급, SCOPUS 등재논문 | en_US |
dc.relation.sci | SCI | en_US |
dc.collections.name | Journal Papers | en_US |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | PHYSICAL REVIEW B, v.45, no.4, pp.1705 - 1711 | - |
dc.identifier.wosid | A1992HB92900022 | - |
dc.citation.endPage | 1711 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | 1705 | - |
dc.citation.title | PHYSICAL REVIEW B | - |
dc.citation.volume | 45 | - |
dc.contributor.affiliatedAuthor | Chung, J. W. | - |
dc.identifier.scopusid | 2-s2.0-0009264378 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 7 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | VIBRATIONAL-SPECTRA | - |
dc.subject.keywordPlus | INITIAL-STAGES | - |
dc.subject.keywordPlus | VITREOUS SIO2 | - |
dc.subject.keywordPlus | SI(111) | - |
dc.subject.keywordPlus | CHEMISORPTION | - |
dc.subject.keywordPlus | OXIDATION | - |
dc.subject.keywordPlus | NEUTRON | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | MODEL | - |
dc.subject.keywordPlus | EELS | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
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