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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Park, Geonwoo | - |
| dc.contributor.author | Kim, Keunhoi | - |
| dc.contributor.author | Shin, Jeong Woo | - |
| dc.contributor.author | Han, Geongu | - |
| dc.contributor.author | Go, Dohyun | - |
| dc.contributor.author | An, Jihwan | - |
| dc.date.accessioned | 2024-03-05T05:50:12Z | - |
| dc.date.available | 2024-03-05T05:50:12Z | - |
| dc.date.created | 2024-03-03 | - |
| dc.date.issued | 2024-02 | - |
| dc.identifier.issn | 0256-1115 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/120879 | - |
| dc.language | English | - |
| dc.publisher | 한국화학공학회 | - |
| dc.relation.isPartOf | Korean Journal of Chemical Engineering | - |
| dc.title | Hydrogen Plasma-Assisted Atomic Layer Deposition of Ru with Low Oxygen Content | - |
| dc.type | Article | - |
| dc.identifier.doi | 10.1007/s11814-024-00035-2 | - |
| dc.type.rims | ART | - |
| dc.identifier.bibliographicCitation | Korean Journal of Chemical Engineering | - |
| dc.citation.title | Korean Journal of Chemical Engineering | - |
| dc.contributor.affiliatedAuthor | An, Jihwan | - |
| dc.identifier.scopusid | 2-s2.0-85185497474 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
| dc.description.isOpenAccess | Y | - |
| dc.type.docType | Article | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | kci | - |
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