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dc.contributor.authorMOSTAFA, HABIBI-
dc.contributor.authorJANG, HO JUNG-
dc.contributor.authorAzaripour Masouleh, Pendar-
dc.contributor.authorLEE, KYUMIN-
dc.contributor.authorOH, SEUNGYEOL-
dc.contributor.authorHWANG, HYUNSANG-
dc.date.accessioned2024-03-05T09:00:38Z-
dc.date.available2024-03-05T09:00:38Z-
dc.date.created2024-03-04-
dc.date.issued2024-01-26-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/120997-
dc.languageEnglish-
dc.publisher포항공대, 한국반도체산업협회, 한국반도체연구조합-
dc.relation.isPartOf제 31회 한국반도체학술대회-
dc.titleReliable HZO (0.5) Based Ferroelectric Memory with Ultra-low Operation Voltage of 1.1V by Synergy Effect of Thickness Scaling and Microwave Annealing-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitation제 31회 한국반도체학술대회-
dc.citation.conferenceDate2024-01-24-
dc.citation.conferencePlaceKO-
dc.citation.title제 31회 한국반도체학술대회-
dc.contributor.affiliatedAuthorMOSTAFA, HABIBI-
dc.contributor.affiliatedAuthorJANG, HO JUNG-
dc.contributor.affiliatedAuthorAzaripour Masouleh, Pendar-
dc.contributor.affiliatedAuthorLEE, KYUMIN-
dc.contributor.affiliatedAuthorOH, SEUNGYEOL-
dc.contributor.affiliatedAuthorHWANG, HYUNSANG-
dc.description.journalClass2-
dc.description.journalClass2-

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황현상HWANG, HYUNSANG
Dept of Materials Science & Enginrg
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