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Electrical characteristics of sub-5 nm SnO2 deposited using Atomic Layer Infiltration (ALI) process
- Title
- Electrical characteristics of sub-5 nm SnO2 deposited using Atomic Layer Infiltration (ALI) process
- Authors
- HAE, WON LEE; KIM, SOYOUNG; 이호인; LEE, YONGSU; SEUNG, MO KIM; 황현준; LEE, BYOUNG HUN
- Date Issued
- 2023-03-09
- Publisher
- IEEE
- Article Type
- Conference
- Citation
- Electron Devices Technology and Manufacturing(EDTM) Confernce 2023, 2023-03-09
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Related Researcher
- 황현준HWANG, HYEON JUN
- Dept of Electrical Enginrg