A high-throughput method for large scale meta-holograms via one-step printing
SCIE
SCOPUS
- Title
- A high-throughput method for large scale meta-holograms via one-step printing
- Authors
- Park, Chanwoong; Kim, Wonjoong; Kim, Yeseul; Sung, Hansang; Park, Jaein; Song, Hyoin; Kim, Joohoon; Oh, Dong Kyo; Kang, Hyunjung; Jeon, Nara; RHO, JUNSUK; Lee, Heon
- Date Issued
- 2024-03
- Publisher
- John Wiley and Sons Inc.
- Abstract
- Metasurfaces, which are designed by arranging meta-atoms, have attracted attention for their ability to create optical properties that do not exist in nature. However, previous methods for fabricating metasurfaces using electron-beam lithography (EBL) are expensive and have limited production capacity, inhibiting mass production. In this study, a new manufacturing method is demonstrated using an argon fluoride (ArF) scanner and nanoimprint lithography (NIL) to overcome these limitations. 266 millimeter-scale metasurfaces are designed and fabricated on an 8-inch wafer using an ArF scanner. Subsequently, this is used as a master stamp to replicate the metasurfaces in an 8-inch wafer scale through the NIL process all at once. To demonstrate the effectiveness of this method, a metahologram is designed and manufactured using TiO2 nanoparticle-embedded-resin (nano-PER). The metahologram achieves an 81.2% yield during replication, with a maximum efficiency of 60.7% at 450 nm, 45.1% at 532 nm, and 38.5% at 635 nm, respectively. The results demonstrate the production of practical metaholograms using low-cost and high-throughput processes.
A cost-effective method is developed using an Argon fluoride (ArF) scanner and nanoimprint lithography (NIL) to produce metasurfaces, overcoming the limitations of previous methods. It enables the fabrication of millimeter-scale metasurfaces and replicates them in one step using an 8-inch master stamp. The metaholograms demonstrate high efficiency at various wavelengths, highlighting the potential for practical, cost-effective production. image
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/123598
- DOI
- 10.1002/adom.202301562
- Article Type
- Article
- Citation
- Advanced Optical Materials, 2024-03
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