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Cited 10 time in webofscience Cited 10 time in scopus
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dc.contributor.authorPark, S-
dc.contributor.authorSiddik, M-
dc.contributor.authorNoh, J-
dc.contributor.authorLee, D-
dc.contributor.authorMoon, K-
dc.contributor.authorWoo, J-
dc.contributor.authorLee, BH-
dc.contributor.authorHwang, H-
dc.date.accessioned2016-03-31T07:23:54Z-
dc.date.available2016-03-31T07:23:54Z-
dc.date.created2015-02-26-
dc.date.issued2014-10-
dc.identifier.issn0268-1242-
dc.identifier.other2014-OAK-0000032337-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/13588-
dc.description.abstractWe propose a redox-based tunable memristive device for neuromorphic applications. First, we report the implementation of a 150 nm Pt/TiNx/Pr0.7Ca0.3MnO3(PCMO)/Pt memristive device with multi-level storage capability for use as an electronic synapse. In addition, we investigate the tunable memristive characteristics on Schottky barrier modulation. The Schottky barrier was formed by the interface between a TiNx electrode and a p-type PCMO. By changing the nitrogen gas flow during the reactive sputter deposition of the TiNx electrode, we have successfully engineered the Schottky barrier height, resulting in the modulation of the current and demonstrating the feasibility of tunable electronic synapses.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherInstitute of Physics Publishing (IOP)-
dc.relation.isPartOfSemiconductor Science and Technology-
dc.subjectmemristive device-
dc.subjectneuromorphic device-
dc.subjectresistive device-
dc.subjectWORK FUNCTION-
dc.subjectSYSTEMS-
dc.titleA nitrogen-treated memristive device for tunable electronic synapses-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1088/0268-1242/29/10/104006-
dc.author.googlePark, S-
dc.author.googleSiddik, M-
dc.author.googleNoh, J-
dc.author.googleLee, D-
dc.author.googleMoon, K-
dc.author.googleWoo, J-
dc.author.googleLee, BH-
dc.author.googleHwang, H-
dc.relation.volume29-
dc.relation.issue10-
dc.relation.startpage104006-
dc.relation.lastpage104010-
dc.contributor.id10079928-
dc.relation.journalSemiconductor Science and Technology-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationSemiconductor Science and Technology, v.29, no.10, pp.104006 - 104010-
dc.identifier.wosid000342389600007-
dc.date.tcdate2019-01-01-
dc.citation.endPage104010-
dc.citation.number10-
dc.citation.startPage104006-
dc.citation.titleSemiconductor Science and Technology-
dc.citation.volume29-
dc.contributor.affiliatedAuthorHwang, H-
dc.identifier.scopusid2-s2.0-84907193005-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc5-
dc.description.scptc4*
dc.date.scptcdate2018-05-121*
dc.type.docTypeArticle-
dc.subject.keywordAuthormemristive device-
dc.subject.keywordAuthorneuromorphic device-
dc.subject.keywordAuthorresistive device-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-

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황현상HWANG, HYUNSANG
Dept of Materials Science & Enginrg
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