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Cited 5 time in webofscience Cited 5 time in scopus
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dc.contributor.authorLee, MJ-
dc.contributor.authorBaek, CK-
dc.contributor.authorPark, S-
dc.contributor.authorChung, IY-
dc.contributor.authorPark, YJ-
dc.date.accessioned2016-03-31T07:30:54Z-
dc.date.available2016-03-31T07:30:54Z-
dc.date.created2015-02-17-
dc.date.issued2009-09-
dc.identifier.issn0038-1101-
dc.identifier.other2009-OAK-0000032026-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/13715-
dc.description.abstractWe have experimentally analyzed the leakage mechanism by comparing the planar DRAM cell and the recently developed DRAM cell transistors that have deeply recessed channels. We have identified important differences in the leakage mechanisms between planar MOSFETs and recessed channel MOSFETs, so we can suggest guidelines with respect to the optimal device structures for the recessed channel DRAM cell. (C) 2009 Elsevier Ltd. All rights reserved.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherElsevier-
dc.relation.isPartOfSOLID-STATE ELECTRONICS-
dc.subjectDynamic random access memory (DRAM)-
dc.subjectRecessed channel array transistor (RCAT)-
dc.subjectLeakage current-
dc.subjectCELL TRANSISTOR-
dc.titleA Comparative Study of the DRAM Leakage Mechanism for Planar and Recessed Channel MOSFETs-
dc.typeArticle-
dc.contributor.college창의IT융합공학과-
dc.identifier.doi10.1016/J.SSE.2009.04.011-
dc.author.googleLee, MJ-
dc.author.googleBaek, CK-
dc.author.googlePark, S-
dc.author.googleChung, IY-
dc.author.googlePark, YJ-
dc.relation.volume53-
dc.relation.issue9-
dc.relation.startpage998-
dc.relation.lastpage1000-
dc.contributor.id10644344-
dc.relation.journalSOLID-STATE ELECTRONICS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationSOLID-STATE ELECTRONICS, v.53, no.9, pp.998 - 1000-
dc.identifier.wosid000269091900013-
dc.date.tcdate2019-01-01-
dc.citation.endPage1000-
dc.citation.number9-
dc.citation.startPage998-
dc.citation.titleSOLID-STATE ELECTRONICS-
dc.citation.volume53-
dc.contributor.affiliatedAuthorBaek, CK-
dc.identifier.scopusid2-s2.0-67651083447-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc4-
dc.description.scptc4*
dc.date.scptcdate2018-05-121*
dc.type.docTypeArticle-
dc.subject.keywordAuthorDynamic random access memory (DRAM)-
dc.subject.keywordAuthorRecessed channel array transistor (RCAT)-
dc.subject.keywordAuthorLeakage current-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-

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