Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel
SCIE
SCOPUS
- Title
- Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel
- Authors
- Kang, H; Lee, CS; Kim, DY; Kim, J; Choi, W; Kim, H
- Date Issued
- 2011-04-27
- Publisher
- ELSEVIER SCIENCE BV
- Abstract
- The thermal atomic layer deposition (Th-ALD) of TiO2 films on stainless steel for use as a photocatalyst was investigated and compared to plasma-enhanced ALD (PE-ALD) using the same precursor. Th-ALD TiO2 films were deposited on stainless steel using a Ti(NMe2)(4) [tetrakis(dimethylamido)Ti,TDMAT] precursor. The microstructure of the Th-ALD TiO2 films was greatly dependent on the growth temperature as an amorphous structure was obtained at 200 degrees C and a polycrystalline structure was achieved at temperatures above 300 degrees C. From the contact angle measurement of water, the crystalline TiO2 films exhibited super-hydrophilicity after UV irradiation. The anatase phase of both the Th- and PE-ALD TiO2 films grown on stainless steel showed higher photocatalytic abilities than the rutile phase grown at 400 degrees C. In addition, the anatase PE-ALD TiO2 film demonstrated a higher photocatalytic efficiency than the Th-ALD films. The photocatalytic efficiency of the Th-ALD TiO2 films was investigated as a function of film thickness and it was found that the efficiency was saturated above a film thickness of 120 nm. (C) 2011 Elsevier B.V. All rights reserved.
- Keywords
- Atomic layer deposition; Photocatalyst; TiO2; PLASMA-ENHANCED ALD; THIN-FILMS; THICKNESS; SUBSTRATE; CVD; SURFACES; COATINGS; GLASS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/13925
- DOI
- 10.1016/J.APCATB.2011.03.010
- ISSN
- 0926-3373
- Article Type
- Article
- Citation
- APPLIED CATALYSIS B-ENVIRONMENTAL, vol. 104, no. 1, page. 6 - 11, 2011-04-27
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.