Fabrication of multi-scale structures with multiple X-ray masks and synchrotron hard X-ray irradiations
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SCOPUS
KCI
- Title
- Fabrication of multi-scale structures with multiple X-ray masks and synchrotron hard X-ray irradiations
- Authors
- Kim, JH; Chang, SS; Lim, G
- Date Issued
- 2014-05
- Publisher
- Elsevier
- Abstract
- Synchrotron hard X-ray irradiation can be utilized in lithography processes to manufacture precise structures. Due to the difficulty of precise X-ray mask fabrication in hard X-ray lithography, this X-ray process has been used mainly to fabricate precise microstructures. In this study, a technology is proposed for fabricating novel multi-scale patterns that include submicron-scale structures using hard X-rays. The required X-ray masks for submicron-sized patterning are fabricated by a simple UV lithography process and sidewall metal deposition. Above all, thanks to the high penetration capability of hard X-rays with sub-nanometer wavelengths, it is possible to employ multiple masks to fabricate a variety of patterns. By combining each sub-micron X-ray mask with typical micro-sized X-ray masks, a unique X-ray lithography is performed, and various multi-scale structures are fabricated. The usefulness of the proposed technology is demonstrated by the realization of these structures. (C) 2014 Published by Elsevier B.V.
- Keywords
- Multiple masks; Sub-micron pattern; Multi-scale; Hard X-ray; LIGA; LIGA TECHNOLOGY; LITHOGRAPHY
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/14484
- DOI
- 10.1016/J.CAP.2014.03.013
- ISSN
- 1567-1739
- Article Type
- Article
- Citation
- Current Applied Physics, vol. 14, no. 5, page. 833 - 837, 2014-05
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- There are no files associated with this item.
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