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Strain-relieving ridge structure in a wetting layer on the W(110) surface SCIE SCOPUS

Title
Strain-relieving ridge structure in a wetting layer on the W(110) surface
Authors
Kim, THSeo, JChoi, JChoi, BYSong, YJKuk, YKahng, SJ
Date Issued
2005-12-05
Publisher
Elsevier B. V.
Abstract
The growth behavior and atomic structure of the Ag wetting layer grown on the W(110) surface, was studied with scanning tunneling microscopy. Deposited Ag atoms preferentially adsorb at the step edges and reveal a step-flow growth behavior at room temperature. In the Ag wetting layer, a periodic bright ridge structure was observed along the [3 3 7] and [3 3 7] directions. The atomic registry of the ridge structure is proposed on the basis of atomically resolved images. (c) 2005 Published by Elsevier B.V.
Keywords
scanning tunneling microscopy; epitaxy; nanostructures; surface structure; SCANNING-TUNNELING-MICROSCOPY; GROWTH; FILMS; AU; AG; CU
URI
https://oasis.postech.ac.kr/handle/2014.oak/15103
DOI
10.1016/J.SUSC.2005.07.034
ISSN
0039-6028
Article Type
Article
Citation
Surface Science, vol. 595, no. 1-3, page. 30 - 34, 2005-12-05
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