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Cited 70 time in webofscience Cited 74 time in scopus
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dc.contributor.authorLiu, X-
dc.contributor.authorSadaf, SM-
dc.contributor.authorSon, M-
dc.contributor.authorPark, J-
dc.contributor.authorShin, J-
dc.contributor.authorLee, W-
dc.contributor.authorSeo, K-
dc.contributor.authorLee, D-
dc.contributor.authorHwang, H-
dc.date.accessioned2016-03-31T08:42:05Z-
dc.date.available2016-03-31T08:42:05Z-
dc.date.created2013-03-08-
dc.date.issued2012-02-
dc.identifier.issn0741-3106-
dc.identifier.other2012-OAK-0000026959-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/15856-
dc.description.abstractTo integrate bipolar resistive switching cells into crosspoint structures, we serially connect a threshold-switching (TS) Pt/NbO2/Pt device with a memory-switching (MS) Pt/Nb2O5/Pt device and observe the suppression of the undesired sneak current. A simpler Pt/Nb2O5/NbO2/Pt bilayer oxide device was designed; it simultaneously exhibits TS and MS. The unique device characteristics in the metal/oxide/metal structure can be directly integrated into a crosspoint memory array without the diode; this can significantly reduce the fabrication complexity.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherIEEE Electron Devices Society-
dc.relation.isPartOfIEEE ELECTRON DEVICE LETTERS-
dc.subjectCrosspoint memory-
dc.subjectniobium oxide-
dc.subjectnonvolatile memory-
dc.subjectresistive switching (RS)-
dc.subjectthreshold switching (TS)-
dc.subjectPOLYCRYSTALLINE NB2O5-
dc.subjectNEGATIVE-RESISTANCE-
dc.subjectNONVOLATILE MEMORY-
dc.subjectOXIDE FILMS-
dc.titleCo-occurrence of Threshold Switching and Memory Switching in Pt/NbOx/Pt Cells for Crosspoint Memory Applications-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1109/LED.2011.2174452-
dc.author.googleLiu, X-
dc.author.googleSadaf, SM-
dc.author.googleSon, M-
dc.author.googlePark, J-
dc.author.googleShin, J-
dc.author.googleLee, W-
dc.author.googleSeo, K-
dc.author.googleLee, D-
dc.author.googleHwang, H-
dc.relation.volume33-
dc.relation.issue2-
dc.relation.startpage236-
dc.relation.lastpage238-
dc.contributor.id10079928-
dc.relation.journalIEEE ELECTRON DEVICE LETTERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationIEEE ELECTRON DEVICE LETTERS, v.33, no.2, pp.236 - 238-
dc.identifier.wosid000299812300036-
dc.date.tcdate2019-01-01-
dc.citation.endPage238-
dc.citation.number2-
dc.citation.startPage236-
dc.citation.titleIEEE ELECTRON DEVICE LETTERS-
dc.citation.volume33-
dc.contributor.affiliatedAuthorHwang, H-
dc.identifier.scopusid2-s2.0-84856295388-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc33-
dc.description.scptc33*
dc.date.scptcdate2018-05-121*
dc.type.docTypeArticle-
dc.subject.keywordAuthorCrosspoint memory-
dc.subject.keywordAuthorniobium oxide-
dc.subject.keywordAuthornonvolatile memory-
dc.subject.keywordAuthorresistive switching (RS)-
dc.subject.keywordAuthorthreshold switching (TS)-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-

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황현상HWANG, HYUNSANG
Dept of Materials Science & Enginrg
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