DC Field | Value | Language |
---|---|---|
dc.contributor.author | Li, YH | - |
dc.contributor.author | Li, XD | - |
dc.contributor.author | Kim, DP | - |
dc.date.accessioned | 2016-03-31T08:47:46Z | - |
dc.date.available | 2016-03-31T08:47:46Z | - |
dc.date.created | 2013-02-19 | - |
dc.date.issued | 2007-11-01 | - |
dc.identifier.issn | 0022-328X | - |
dc.identifier.other | 2007-OAK-0000026494 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/16067 | - |
dc.description.abstract | novel inorganic polymer resin with high photosensitivity was prepared by grafting acrylate functional groups onto the backbone of polyvinylsilazane through a reaction with methyl-2-(bromo-methyl)acrylate via the highly efficient electrophilic substitution of allyl bromide. The as-modified polymer was characterized by H-1 NMR and 2D-H-1-H-1 NMR (COSY) methods to determine the reaction mechanism. Differential photocalorimetry, FT-IR spectroscopy and TGA were used to examine its properties. The modified polyvinylsilazane is a promising inorganic polymer photoresist with a high UV sensitivity and a 55% ceramic yield, which is useful for fabricating nonoxide ceramic microstructures using mold free photocuring shaping processes. (c) 2007 Elsevier B.V. All rights reserved. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | Elsevier B.V | - |
dc.relation.isPartOf | Journal of Organometallic Chemistry | - |
dc.subject | inorganic polymer | - |
dc.subject | polyvinylsilazane | - |
dc.subject | photoresist | - |
dc.subject | UV sensitivity | - |
dc.subject | CERAMIC MICROSTRUCTURES | - |
dc.subject | FABRICATION | - |
dc.subject | MEMS | - |
dc.title | Acrylation of polyvinylsilazane with allyl bromide for an UV photosensitive inorganic polymer | - |
dc.type | Article | - |
dc.contributor.college | 화학공학과 | - |
dc.identifier.doi | 10.1016/J.JORGANCHEM.2007.08.016 | - |
dc.author.google | Li, YH | - |
dc.author.google | Li, XD | - |
dc.author.google | Kim, DP | - |
dc.relation.volume | 692 | - |
dc.relation.issue | 23 | - |
dc.relation.startpage | 5303 | - |
dc.relation.lastpage | 5306 | - |
dc.contributor.id | 10054896 | - |
dc.relation.journal | Journal of Organometallic Chemistry | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | Journal of Organometallic Chemistry, v.692, no.23, pp.5303 - 5306 | - |
dc.identifier.wosid | 000250934800025 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 5306 | - |
dc.citation.number | 23 | - |
dc.citation.startPage | 5303 | - |
dc.citation.title | Journal of Organometallic Chemistry | - |
dc.citation.volume | 692 | - |
dc.contributor.affiliatedAuthor | Kim, DP | - |
dc.identifier.scopusid | 2-s2.0-34848875688 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 6 | - |
dc.description.scptc | 5 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | CERAMIC MICROSTRUCTURES | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | MEMS | - |
dc.subject.keywordAuthor | inorganic polymer | - |
dc.subject.keywordAuthor | polyvinylsilazane | - |
dc.subject.keywordAuthor | photoresist | - |
dc.subject.keywordAuthor | UV sensitivity | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Inorganic & Nuclear | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Organic | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
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