Controlled electroless deposition of noble metal nanoparticle films on germanium surfaces

Abstract

Thin noble metal films have been prepared as a result of the immersion of germanium substrates into dilute, aqueous solutions of AuCl4-, PdCl42-, or PtCl42-, respectively. Deposition proceeds via galvanic displacement in the absence of fluoride, pH adjusters, complexing agents, or external reducing agents. This manner of metal deposition serves as a cost-effective, high-throughput methodology with control over surface morphology and deposition rate by modulation of plating parameters such as concentration, temperature, and immersion time.