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Cited 7 time in webofscience Cited 8 time in scopus
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dc.contributor.authorXu, CK-
dc.contributor.authorKim, M-
dc.contributor.authorChung, SY-
dc.contributor.authorChun, J-
dc.contributor.authorKim, DE-
dc.date.accessioned2016-03-31T12:11:01Z-
dc.date.available2016-03-31T12:11:01Z-
dc.date.created2009-08-20-
dc.date.issued2004-11-01-
dc.identifier.issn0009-2614-
dc.identifier.other2004-OAK-0000004636-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/17643-
dc.description.abstractSiGaN/SiOxNy nanocables and SiOxNy-based nanostructures on silicon and silica substrates, respectively, have been firstly synthesized via using GaN as a resource of Ga. The silica wafer is mainly responsible for the formation of SiOxNy-based nanostructures and the intermediate Ga plays an important role in the formation of diverse nanostructures. SEM, TEM, line scan and SAED were employed to characterize as-prepared samples. The growth mechanism of as-prepared samples is also discussed. (C) 2004 Elsevier B.V. All rights reserved.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.relation.isPartOfCHEMICAL PHYSICS LETTERS-
dc.subjectLIQUID-PHASE EPITAXY-
dc.subjectSILICON-
dc.subjectNANOWIRES-
dc.subjectTHIN-
dc.subjectSIO2-
dc.subjectN2O-
dc.subjectPHOTOLUMINESCENCE-
dc.subjectOXYNITRIDES-
dc.subjectGROWTH-
dc.titleThe formation of SiGaN/SiOxNy nanocables and SiOxNy-based nanostructures using GaN as a resource of Ga-
dc.typeArticle-
dc.contributor.college물리학과-
dc.identifier.doi10.1016/j.cplett.2004.09.066-
dc.author.googleXu, CK-
dc.author.googleKim, M-
dc.author.googleChung, SY-
dc.author.googleChun, J-
dc.author.googleKim, DE-
dc.relation.volume398-
dc.relation.issue1-3-
dc.relation.startpage264-
dc.relation.lastpage269-
dc.contributor.id10075453-
dc.relation.journalCHEMICAL PHYSICS LETTERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationCHEMICAL PHYSICS LETTERS, v.398, no.1-3, pp.264 - 269-
dc.identifier.wosid000224720300048-
dc.date.tcdate2019-01-01-
dc.citation.endPage269-
dc.citation.number1-3-
dc.citation.startPage264-
dc.citation.titleCHEMICAL PHYSICS LETTERS-
dc.citation.volume398-
dc.contributor.affiliatedAuthorKim, DE-
dc.identifier.scopusid2-s2.0-5744221733-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc7-
dc.type.docTypeArticle-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusTHIN-
dc.subject.keywordPlusN2O-
dc.subject.keywordPlusPHOTOLUMINESCENCE-
dc.subject.keywordPlusGROWTH-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryPhysics, Atomic, Molecular & Chemical-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaPhysics-

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