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Cited 38 time in webofscience Cited 44 time in scopus
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dc.contributor.authorKim, JK-
dc.contributor.authorWaldron, EL-
dc.contributor.authorLi, YL-
dc.contributor.authorGessmann, T-
dc.contributor.authorSchubert, EF-
dc.contributor.authorJang, HW-
dc.contributor.authorLee, JL-
dc.date.accessioned2016-03-31T12:29:50Z-
dc.date.available2016-03-31T12:29:50Z-
dc.date.created2009-02-28-
dc.date.issued2004-04-26-
dc.identifier.issn0003-6951-
dc.identifier.other2004-OAK-0000004190-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/17973-
dc.description.abstractSynchrotron radiation photoemission spectroscopy reveals enhanced oxygen incorporation in AlxGa1-xN as the Al mole fraction increases. It is shown that the increased oxygen donor incorporation can result in a conductivity-type change from p-type to n-type in Mg-doped AlxGa1-xN. Consistent with the conductivity-type change, epitaxial Al0.20Ga0.80N films exhibit n-type conductivity despite heavy Mg doping. The p-type conductivity of bulk AlxGa1-xN with a high Al mole fraction can be improved by employing AlxGa1-xN/AlyGa1-yN superlattices (SLs). At 300 K, Mg-doped Al0.17Ga0.83N/Al0.36Ga0.64N SLs (average Al mole fraction of 23%) exhibit strong p-type conductivity with a specific resistance of 4.6 Omega cm, a hole mobility of 18.8 cm(2)/Vs, and an acceptor activation energy of 195 meV. (C) 2004 American Institute of Physics.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.titleP-type conductivity in bulk AlxGa1-xN and AlxGa1-xN/AlyGa1-yN superlattices with average Al mole fraction > 20%-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1063/1.1728322-
dc.author.googleKim, JK-
dc.author.googleWaldron, EL-
dc.author.googleLi, YL-
dc.author.googleGessmann, T-
dc.author.googleSchubert, EF-
dc.author.googleJang, HW-
dc.author.googleLee, JL-
dc.relation.volume84-
dc.relation.issue17-
dc.relation.startpage3310-
dc.relation.lastpage3312-
dc.contributor.id10105416-
dc.relation.journalAPPLIED PHYSICS LETTERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.84, no.17, pp.3310 - 3312-
dc.identifier.wosid000220958100030-
dc.date.tcdate2019-01-01-
dc.citation.endPage3312-
dc.citation.number17-
dc.citation.startPage3310-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume84-
dc.contributor.affiliatedAuthorKim, JK-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-2542491295-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc30-
dc.description.scptc27*
dc.date.scptcdate2018-05-121*
dc.type.docTypeArticle-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusMG-DOPED GAN-
dc.subject.keywordPlusALGAN/GAN SUPERLATTICES-
dc.subject.keywordPlusACCEPTOR ACTIVATION-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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