Pattern formation in ultrathin films of a novel dimethylsiloxane-acrylate triblock copolymer
SCIE
SCOPUS
- Title
- Pattern formation in ultrathin films of a novel dimethylsiloxane-acrylate triblock copolymer
- Authors
- Han, JT; Cho, K
- Date Issued
- 2003-11-18
- Publisher
- AMER CHEMICAL SOC
- Keywords
- GLASS-TRANSITION TEMPERATURE; POLYMER THIN-FILMS; DIBLOCK COPOLYMER; BLOCK-COPOLYMERS; SURFACE; SPECTROSCOPY; SEPARATION; MORPHOLOGY; STYRENE
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/18241
- DOI
- 10.1021/MA034930P
- ISSN
- 0024-9297
- Article Type
- Article
- Citation
- MACROMOLECULES, vol. 36, no. 23, page. 8902 - 8905, 2003-11-18
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- There are no files associated with this item.
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