DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, IW | - |
dc.contributor.author | Kim, KH | - |
dc.contributor.author | Suh, JH | - |
dc.contributor.author | Park, CG | - |
dc.date.accessioned | 2016-03-31T12:49:53Z | - |
dc.date.available | 2016-03-31T12:49:53Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2003-06 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.other | 2003-OAK-0000003455 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/18499 | - |
dc.description.abstract | Superhard quarternary Ti-Al-Si-N films were synthesized by using a hybrid coating technique involving arc-ion plating and sputtering methods. The relationship between microhardness and microstructural changes due to the percolation phenomenon of amorphous silicon-nitride in Ti-Al-Si-N films during the deposition process was investigated. The synthesized Ti-Al-Si-N films were revealed to be composites of (Ti, Al)N crystallites distributed in an amorphous Si3N4 matrix. Due to the percolation of amorphous silicon-nitride, the grain size of (Ti, Al)N crystallites was decreased with increasing Si content. When the Si content was about 9 at.%, the film: was characterized as a nanocomposite, nc-(Ti, Al)N/a-Si3N4, and showed a maximum hardness of about 55 GPa. This hardness value was significantly larger than that of a pure (Ti, Al)N film(similar to35 GPa). The increased hardness of the (Ti, Al)N film with Si addition was probably due to grain boundary hardening through both the Hall-Petch relation derived, from grain size refinement and the strong cohesive energy of interphase boundaries caused by the percolation of amorphous Si3N4 into the (Ti, Al)N film. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.relation.isPartOf | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.subject | Ti-Al-Si-N | - |
dc.subject | superhardness | - |
dc.subject | nanocomposite | - |
dc.subject | percolation phenomenon | - |
dc.subject | amorphous Si3N4 | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | MECHANICAL-PROPERTIES | - |
dc.subject | COATINGS | - |
dc.subject | MICROSTRUCTURE | - |
dc.subject | BEHAVIOR | - |
dc.title | Role of amorphous Si3N4 in the microhardness of Ti-Al-Si-N nanocomposite films | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.author.google | Park, IW | - |
dc.author.google | Kim, KH | - |
dc.author.google | Suh, JH | - |
dc.author.google | Park, CG | - |
dc.relation.volume | 42 | - |
dc.relation.issue | 6 | - |
dc.relation.startpage | 783 | - |
dc.relation.lastpage | 786 | - |
dc.contributor.id | 10069857 | - |
dc.relation.journal | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.42, no.6, pp.783 - 786 | - |
dc.identifier.wosid | 000183537900011 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 786 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 783 | - |
dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.volume | 42 | - |
dc.contributor.affiliatedAuthor | Park, CG | - |
dc.identifier.scopusid | 2-s2.0-0037493025 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 12 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | MECHANICAL-PROPERTIES | - |
dc.subject.keywordPlus | OXIDATION BEHAVIOR | - |
dc.subject.keywordPlus | MICROSTRUCTURE | - |
dc.subject.keywordPlus | DEPOSITION | - |
dc.subject.keywordPlus | NITRIDE | - |
dc.subject.keywordAuthor | Ti-Al-Si-N | - |
dc.subject.keywordAuthor | superhardness | - |
dc.subject.keywordAuthor | nanocomposite | - |
dc.subject.keywordAuthor | percolation phenomenon | - |
dc.subject.keywordAuthor | amorphous Si3N4 | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Physics | - |
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