DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeong, JH | - |
dc.contributor.author | Lim, SW | - |
dc.contributor.author | Yong, KJ | - |
dc.date.accessioned | 2016-03-31T12:51:46Z | - |
dc.date.available | 2016-03-31T12:51:46Z | - |
dc.date.created | 2009-04-02 | - |
dc.date.issued | 2003-02 | - |
dc.identifier.issn | 0218-625X | - |
dc.identifier.other | 2003-OAK-0000003344 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/18572 | - |
dc.description.abstract | The thermal decomposition pathway and desorption of diethylamido of tetrakis(diethylamido)zirconium [TDEAZr, Zr(N(C2H5)(2))(4)] on Si(100) were studied using temperature-programmed desorption (TPD) and X-ray photoelectron spectroscopy (XPS). During TPD experiments, ethylethyleneimine (C2H5N=CHCH3), diethylamine [NH(C2H5)(2)], acetonitrile (CH3CN), ethylene (C2H4) and hydrogen (H-2) desorbed as the main decomposition products of diethylamido, which was chemisorbed on Si(100) through the scission of the zirconium-diethylamido bond in TDEAZr. After TPD runs, the formation of silicon carbide and silicon nitride was observed on the surface by XPS, indicating that a complete decomposition of diethylamido proceeded. This could be a reaction pathway of C, N incorporation in the thin film growth using TDEAZr as a Zr precursor. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | WORLD SCIENTIFIC PUBL CO PTE LTD | - |
dc.relation.isPartOf | SURFACE REVIEW AND LETTERS | - |
dc.subject | TPD | - |
dc.subject | tetrakis(diethylamido)zirconium | - |
dc.subject | thermal decomposition | - |
dc.subject | Si(100) | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | SURFACE-CHEMISTRY | - |
dc.subject | ADSORPTION | - |
dc.subject | ETHYLAMINE | - |
dc.subject | STABILITY | - |
dc.subject | GROWTH | - |
dc.title | Thermal decomposition and desorption of diethylamido of tetrakis (diethylamido) zirconium (TDEAZr) on Si(100) | - |
dc.type | Article | - |
dc.contributor.college | 화학공학과 | - |
dc.identifier.doi | 10.1142/S0218625X03004706 | - |
dc.author.google | Jeong, JH | - |
dc.author.google | Lim, SW | - |
dc.author.google | Yong, KJ | - |
dc.relation.volume | 10 | - |
dc.relation.issue | 1 | - |
dc.relation.startpage | 121 | - |
dc.relation.lastpage | 125 | - |
dc.contributor.id | 10131864 | - |
dc.relation.journal | SURFACE REVIEW AND LETTERS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | SURFACE REVIEW AND LETTERS, v.10, no.1, pp.121 - 125 | - |
dc.identifier.wosid | 000182377900016 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 125 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 121 | - |
dc.citation.title | SURFACE REVIEW AND LETTERS | - |
dc.citation.volume | 10 | - |
dc.contributor.affiliatedAuthor | Yong, KJ | - |
dc.identifier.scopusid | 2-s2.0-0037322350 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 2 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | SURFACE-CHEMISTRY | - |
dc.subject.keywordPlus | ADSORPTION | - |
dc.subject.keywordPlus | ETHYLAMINE | - |
dc.subject.keywordPlus | STABILITY | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordAuthor | TPD | - |
dc.subject.keywordAuthor | tetrakis(diethylamido)zirconium | - |
dc.subject.keywordAuthor | thermal decomposition | - |
dc.subject.keywordAuthor | Si(100) | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Physics | - |
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