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Effect of surface treatment on Schottky barrier height of p-type GaN SCIE SCOPUS

Title
Effect of surface treatment on Schottky barrier height of p-type GaN
Authors
Kim, JKLee, JL
Date Issued
2003-03
Publisher
ELECTROCHEMICAL SOC INC
Abstract
The chemical bonding state and atomic composition at the surface of p-type GaN were studied by synchrotron radiation photo-emission spectroscopy. Ga-related oxides existed even after surface treatment using HCl solution, causing pinning of the surface Fermi level (E-F) at 0.62 eV above valence band maximum (E-V). Meanwhile, aqua regia treatment is effective in removing the surface oxide, resulting in the movement of the Fermi level toward E-V (E-F - E-V = 0.30 eV). This resulted from the existence of Ga vacancies underneath the surface oxide. As a result, the slope in the plot of Schottky barrier height with the metal work function was increased. (C) 2003 The Electrochemical Society.
URI
https://oasis.postech.ac.kr/handle/2014.oak/18680
DOI
10.1149/1.1544637
ISSN
0013-4651
Article Type
Article
Citation
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 150, no. 3, page. G209 - G211, 2003-03
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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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