Particle-in-cell simulation of a neutral beam source for materials processing

Abstract

Neutral beam processing is being considered as a new technique to reduce plasma-induced damage in materials processing. We report on particle-in-cell simulations of a neutral beam source. The system is composed of an ion-beam source and multireflectors which neutralize incident ions and reflect neutral particles. It is revealed from the simulations that about 2.8% of the ion-current from an ion-beam source is successfully neutralized before reaching a diagnostic plate.