DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, JL | - |
dc.contributor.author | Kim, JK | - |
dc.contributor.author | Weber, MH | - |
dc.contributor.author | Lynn, KG | - |
dc.date.accessioned | 2016-03-31T13:17:48Z | - |
dc.date.available | 2016-03-31T13:17:48Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2001-06-25 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.other | 2001-OAK-0000002043 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/19509 | - |
dc.description.abstract | Pd contacts on both n-type and p-type GaN were studied using positron annihilation spectroscopy, and the results were used to interpret the role of Ga vacancies on the band bending below the contacts. The concentration of Ga vacancy in Si-doped GaN was higher than that in the Mg-doped one. In Si-doped GaN, implanted positrons were annihilated at the nearer surface region and the interface of Pd/n-type GaN was detected by positrons clearly shifted toward the surface of Pd. This suggests that Ga vacancies could act as an interface state, pinning the Fermi level at the interface of Pd with GaN, leading to the production of a negative electric field below the interface. (C) 2001 American Institute of Physics. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | APPLIED PHYSICS LETTERS | - |
dc.title | Positron annihilation study of Pd contacts on impurity-doped GaN | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1063/1.1380395 | - |
dc.author.google | Lee, JL | - |
dc.author.google | Kim, JK | - |
dc.author.google | Weber, MH | - |
dc.author.google | Lynn, KG | - |
dc.relation.volume | 78 | - |
dc.relation.issue | 26 | - |
dc.relation.startpage | 4142 | - |
dc.relation.lastpage | 4144 | - |
dc.contributor.id | 10105416 | - |
dc.relation.journal | APPLIED PHYSICS LETTERS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.78, no.26, pp.4142 - 4144 | - |
dc.identifier.wosid | 000169340000027 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 4144 | - |
dc.citation.number | 26 | - |
dc.citation.startPage | 4142 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 78 | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.contributor.affiliatedAuthor | Kim, JK | - |
dc.identifier.scopusid | 2-s2.0-0035948104 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 7 | - |
dc.type.docType | Article | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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