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Cited 50 time in webofscience Cited 52 time in scopus
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dc.contributor.authorPark, SI-
dc.contributor.authorCho, TS-
dc.contributor.authorDoh, SJ-
dc.contributor.authorLee, JL-
dc.contributor.authorJe, JH-
dc.date.accessioned2016-03-31T13:29:29Z-
dc.date.available2016-03-31T13:29:29Z-
dc.date.created2009-02-28-
dc.date.issued2000-07-17-
dc.identifier.issn0003-6951-
dc.identifier.other2000-OAK-0000001416-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/19944-
dc.description.abstractThe structural evolution during heteroepitaxial growth of ZnO/sapphire(001) by radio-frequency magnetron sputtering has been studied using real-time synchrotron x-ray scattering. The two-dimensional (2D) ZnO(002) layers grown in the initial stage are highly strained and well aligned to the substrate having a mosaic distribution of 0.01 degrees full width at half maximum (FWHM), in sharp contrast to the reported transition 2D layers grown by molecular-beam epitaxy. With increasing film thickness, the lattice strain is relieved and the poorly aligned (1.25 degrees FWHM) three-dimensional (3D) islands are nucleated on the 2D layers. We attribute the 2D-3D transition to the release of the strain energy stored in the film due to the film/substrate lattice mismatch. (C) 2000 American Institute of Physics. [S0003-6951(00)01529-1].-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.titleStructural evolution of ZnO/sapphire(001) heteroepitaxy studied by real time synchrotron x-ray scattering-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1063/1.126972-
dc.author.googlePark, SI-
dc.author.googleCho, TS-
dc.author.googleDoh, SJ-
dc.author.googleLee, JL-
dc.author.googleJe, JH-
dc.relation.volume77-
dc.relation.issue3-
dc.relation.startpage349-
dc.relation.lastpage351-
dc.contributor.id10123980-
dc.relation.journalAPPLIED PHYSICS LETTERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.77, no.3, pp.349 - 351-
dc.identifier.wosid000088052200013-
dc.date.tcdate2019-01-01-
dc.citation.endPage351-
dc.citation.number3-
dc.citation.startPage349-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume77-
dc.contributor.affiliatedAuthorLee, JL-
dc.contributor.affiliatedAuthorJe, JH-
dc.identifier.scopusid2-s2.0-0010522057-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc45-
dc.type.docTypeArticle-
dc.subject.keywordPlusROOM-TEMPERATURE-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusZNO-
dc.subject.keywordPlusEMISSION-
dc.subject.keywordPlusLAYERS-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusPLANE-
dc.subject.keywordPlusTIN-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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