DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cho, B | - |
dc.contributor.author | Choi, E | - |
dc.contributor.author | Chung, S | - |
dc.date.accessioned | 2016-03-31T13:36:07Z | - |
dc.date.available | 2016-03-31T13:36:07Z | - |
dc.date.created | 2009-03-19 | - |
dc.date.issued | 1999-12 | - |
dc.identifier.issn | 0947-8396 | - |
dc.identifier.other | 1999-OAK-0000001051 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/20192 | - |
dc.description.abstract | The oxidation-induced stoichiometric and morphological changes of the oxide film on a stainless-steel surface are observed by X-ray photoelectron spectroscopy and atomic force microscopy for annealing temperatures in the range 400-500 degrees C in oxygen partial pressures of 10(-9) to 10(-4) Torr With increasing the temperature, a significant shift occurs in the Cr 2p(3/2) binding energy towards higher energies, indicating a change in the oxidation state of chromium. It is found that at 450 degrees C lower oxygen partial pressures favor the formation of a smooth, pure chromium oxide. At a low oxygen pressure the oxide formed mainly consists of chromium oxide that shows a markedly smooth surface with no distinct grains, whereas at a high pressure the oxide formed mainly consists of iron oxide with distinct grains. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | SPRINGER VERLAG | - |
dc.relation.isPartOf | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | - |
dc.subject | EXTREME HIGH-VACUUM | - |
dc.subject | FE-CR ALLOYS | - |
dc.subject | PHOTOELECTRON-SPECTROSCOPY | - |
dc.subject | OUTGASSING REDUCTION | - |
dc.subject | AIR | - |
dc.subject | ADSORPTION | - |
dc.subject | PERMEATION | - |
dc.subject | DEUTERIUM | - |
dc.subject | SYSTEM | - |
dc.subject | LAYER | - |
dc.title | Oxidation-induced stoichiometric and morphological change of oxide films on stainless-steel surfaces | - |
dc.type | Article | - |
dc.contributor.college | 물리학과 | - |
dc.identifier.doi | 10.1007/s003390051043 | - |
dc.author.google | Cho, B | - |
dc.author.google | Choi, E | - |
dc.author.google | Chung, S | - |
dc.relation.volume | 69 | - |
dc.relation.issue | 6 | - |
dc.relation.startpage | 625 | - |
dc.relation.lastpage | 630 | - |
dc.contributor.id | 10071841 | - |
dc.relation.journal | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.69, no.6, pp.625 - 630 | - |
dc.identifier.wosid | 000083972000008 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 630 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 625 | - |
dc.citation.title | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | - |
dc.citation.volume | 69 | - |
dc.contributor.affiliatedAuthor | Chung, S | - |
dc.identifier.scopusid | 2-s2.0-0033339518 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 10 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | EXTREME HIGH-VACUUM | - |
dc.subject.keywordPlus | FE-CR ALLOYS | - |
dc.subject.keywordPlus | PHOTOELECTRON-SPECTROSCOPY | - |
dc.subject.keywordPlus | OUTGASSING REDUCTION | - |
dc.subject.keywordPlus | AIR | - |
dc.subject.keywordPlus | ADSORPTION | - |
dc.subject.keywordPlus | PERMEATION | - |
dc.subject.keywordPlus | DEUTERIUM | - |
dc.subject.keywordPlus | SYSTEM | - |
dc.subject.keywordPlus | LAYER | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
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