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dc.contributor.authorCho, TS-
dc.contributor.authorDoh, SJ-
dc.contributor.authorJe, JH-
dc.contributor.authorNoh, DY-
dc.date.accessioned2016-03-31T13:38:05Z-
dc.date.available2016-03-31T13:38:05Z-
dc.date.created2009-02-28-
dc.date.issued1999-01-
dc.identifier.issn0021-4922-
dc.identifier.other1999-OAK-0000000951-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/20263-
dc.description.abstractWe revealed the existence of a very thin (similar to 50 Angstrom thick) epitaxial. iron-oxide interlayer in amorphous Ba-ferrite thin films on sapphire(001) using synchrotron x-ray scattering. Depending on the sputtering gases used in radio frequency sputtering deposition, two different iron-oxide interlayers were formed; non-magnetic alpha-Fe2O3 interlayer by pure Ar gas and ferromagnetic Fe3O4 interlayer by Ar-10% O-2 gas mixture. The alpha-Fe2O3 interlayer much more promoted the crystallization of amorphous Ba-ferrite, compared to the Fe3O4 interlayer. We suggest that the interlayer existing between amorphous Ba-ferrite and sapphire substrate greatly contributes to the reduction of the activation energy for the crystallization of amorphous Baferrite film.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherJAPAN J APPLIED PHYSICS-
dc.relation.isPartOfJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS-
dc.subjectepitaxial Ba-ferrite film-
dc.subjectiron-oxide interlayer-
dc.subjectrf magnetron sputtering-
dc.subjectsynchrotron x-ray scattering-
dc.subjectFERRITE FILMS-
dc.subjectMAGNETIC CHARACTERISTICS-
dc.subjectMEDIA-
dc.subjectINPLANE-
dc.subjectMIXTURE-
dc.subjectO-2-
dc.subjectAR-
dc.subjectXE-
dc.titleIron-oxide interlayer existing in Ba-ferrite/sapphire(001) films grown by sputtering-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.7567/JJAPS.38S1.444-
dc.author.googleCHO, TS-
dc.author.googleDOH, SJ-
dc.author.googleJE, JH-
dc.author.googleNOH, DY-
dc.relation.volume38-
dc.relation.startpage444-
dc.relation.lastpage447-
dc.contributor.id10123980-
dc.relation.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameConference Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.38, pp.444 - 447-
dc.identifier.wosid000082804000111-
dc.date.tcdate2019-01-01-
dc.citation.endPage447-
dc.citation.startPage444-
dc.citation.titleJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS-
dc.citation.volume38-
dc.contributor.affiliatedAuthorJe, JH-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc1-
dc.type.docTypeArticle; Proceedings Paper-
dc.subject.keywordPlusFERRITE FILMS-
dc.subject.keywordPlusMAGNETIC CHARACTERISTICS-
dc.subject.keywordPlusMEDIA-
dc.subject.keywordPlusINPLANE-
dc.subject.keywordPlusMIXTURE-
dc.subject.keywordPlusO-2-
dc.subject.keywordPlusAR-
dc.subject.keywordPlusXE-
dc.subject.keywordAuthorepitaxial Ba-ferrite film-
dc.subject.keywordAuthoriron-oxide interlayer-
dc.subject.keywordAuthorrf magnetron sputtering-
dc.subject.keywordAuthorsynchrotron x-ray scattering-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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제정호JE, JUNG HO
Dept of Materials Science & Enginrg
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