Pd-Ge-Au based hybrid ohmic contacts to high-low doped GaAs field-effect transistor
SCIE
SCOPUS
- Title
- Pd-Ge-Au based hybrid ohmic contacts to high-low doped GaAs field-effect transistor
- Authors
- Kwak, JS; Lee, JL; Baik, BK
- Date Issued
- 1997-09
- Publisher
- JAPAN J APPLIED PHYSICS
- Abstract
- Effects of an intermediate layer, such as Mo or Ti, have been studied for developing Pd-Ge-Au based hybrid ohmic contacts in a high-low doped GaAs metal-semiconductor field-effect transistor (MESFET). The Pd-Ge-Au contact without the intermediate layer produces an alloyed AuGe contact at a high annealing temperature above 400 degrees C. When Mo is added between Pd/Ge and Au, nonspiking Pd/Ge contact is formed at a low annealing temperature of 300 degrees C. The addition of Ti, however, results in an ohmic contact with a low resistance of 0.43 Ohm.m in a wide annealing temperature ranging from 340 to 420 degrees C. Auger depth profile and X-ray diffraction results suggest that the low resistance of the Pd/Ge/Ti/Au ohmic contact is due to formation both the Pd/Ge contact and AuGe contact through the appropriate control of Au indiffusion by Ti. The MESFET with the Pd/Ge/Ti/Au contact displays good DC characteristics. This supports that the Pd/Ge/Ti/Au contact is well suitable for application to high-low doped GaAs MESFETs due to its low-resistance and wide-process-window.
- Keywords
- Pd-Ge-Au based ohmic contact; hybrid contact; GaAs field-effect transistor; N-TYPE GAAS; POWER
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/21176
- DOI
- 10.1143/JJAP.36.5451
- ISSN
- 0021-4922
- Article Type
- Article
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 36, no. 9A, page. 5451 - 5458, 1997-09
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