Self-assembly of aminosilane layers: Determination of surface density of the amine group through a reversible chemical reaction
SCIE
SCOPUS
- Title
- Self-assembly of aminosilane layers: Determination of surface density of the amine group through a reversible chemical reaction
- Authors
- Moon, JH; Shin, JW; Park, JW
- Date Issued
- 1997-01
- Publisher
- GORDON BREACH SCI PUBL LTD
- Abstract
- The surface of a fused silica and oxidized silicon wafer (SiO2/Si(100)) was treated with (3-aminopropyl)triethoxysilane in solution. The silane coupling agent (SCA) produces multilayers with variable thickness (6-100 Angstrom) depending upon the dipping time. The aminosilane layers were allowed to react with 4-nitrobenzaldehyde, and formation of che corresponding imine was confirmed by UV-vis spectroscopy. In aqueous medium the imine was easily hydrolyzed to regenerate the amine group and the aldehyde. Surface density of the amine was calculated from the amount of produced 4-nitrobenzaldehyde. Tilt angles of the chromophore, the imine, obtained from the surface density and A(surf), absorbance of the derviatized substrate, are 23-32 degrees.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/21271
- DOI
- 10.1080/10587259708042826
- ISSN
- 1058-725X
- Article Type
- Article
- Citation
- MOLECULAR CRYSTALS AND LIQUID CRYSTALS SCIENCE AND TECHNOLOGY SECTION A-MOLECULAR CRYSTALS AND LIQUID CRYSTALS, vol. 294, page. 483 - 486, 1997-01
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