VIBRATIONAL PROPERTY OF THE SLOW N2+ IONS DEPOSITED SINX FILMS
SCIE
SCOPUS
- Title
- VIBRATIONAL PROPERTY OF THE SLOW N2+ IONS DEPOSITED SINX FILMS
- Authors
- BAEK, DH; CHUNG, JW
- Date Issued
- 1994-10
- Publisher
- SPRINGER VERLAG
- Abstract
- We have investigated vibrational properties of silicon-nitride films, SiN(x) (0.3 less-than-or-equal-to x less-than-or-equal-to 1.33), produced by a non-thermal method using high-resolution electron energy loss spectroscopy. The results, based on a continuous random network model assuming a planar XY3 vibrational bond unit, show that the Si-N bonds in the films closely resemble those in typical thermal silicon nitride although nitrogens occupy some metastable binding sites. We estimate force constants of the restoring forces for a Si3N bond unit, which tend to increase gradually with increasing nitrogen content x. In particular, the central force constant k1 for the in-plane stretching mode of silicon atoms varies with x in the range 297 less-than-or-equal-to k less-than-or-equal-to 331 N/M, larger than the theoretical value for a nitrogen atom imbedded in a pure Si crystal.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/21883
- DOI
- 10.1007/BF00331727
- ISSN
- 0721-7250
- Article Type
- Article
- Citation
- APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, vol. 59, no. 4, page. 445 - 448, 1994-10
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