THE RELATION BETWEEN THE INTERFACIAL SHEAR-STRESS AND THE WAVE MOTION IN A STRATIFIED FLOW
SCIE
SCOPUS
- Title
- THE RELATION BETWEEN THE INTERFACIAL SHEAR-STRESS AND THE WAVE MOTION IN A STRATIFIED FLOW
- Authors
- KANG, HC; KIM, MH
- Date Issued
- 1993-02
- Publisher
- ELSEVIER
- Abstract
- A model is developed to describe the interfacial shear stress at a wavy interface with wave characteristics. Experiments have been conducted with near-horizontal (4.1-degrees) and near-vertical (87-degrees) flat plates for air-water concurrent stratified flows. The interfacial shear stress and normal and flow directional interface velocities were measured. Assuming a simple relation between the gas velocity near the interface and film thickness, the turbulent shear stress due to the wave motion is expressed by the normal interfacial velocity and the relative gas velocity. The model developed agrees well with the experimental data for a wide range of horizontal and vertical stratified flow.
- Keywords
- WAVES; INTERFACIAL SHEAR STRESS; WAVE VELOCITIES; GAS LIQUID FLOWS; FILM THICKNESS; TURBULENT SHEAR STRESS; STRATIFIED FLOW; CONDUCTANCE PROBE; FALLING LIQUID-FILMS; GAS-FLOW; WALL
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/22101
- DOI
- 10.1016/0301-9322(93)90021-L
- ISSN
- 0301-9322
- Article Type
- Article
- Citation
- INTERNATIONAL JOURNAL OF MULTIPHASE FLOW, vol. 19, no. 2, page. 35 - 49, 1993-02
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- There are no files associated with this item.
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