Article
Cited 1 time in 
Cited 1 time in 
Cited 1 time in
Metadata Downloads
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, GJ | - |
| dc.contributor.author | Lee, SH | - |
| dc.contributor.author | Lee, JK | - |
| dc.date.accessioned | 2016-04-01T01:12:15Z | - |
| dc.date.available | 2016-04-01T01:12:15Z | - |
| dc.date.created | 2009-02-28 | - |
| dc.date.issued | 2008-08 | - |
| dc.identifier.issn | 0093-3813 | - |
| dc.identifier.other | 2008-OAK-0000008074 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/22547 | - |
| dc.description.abstract | Ignition of peripheral plasma was examined in low-pressure (100-mtorr) RF capacitive coupled plasma by means of kinetic and fluid models. Plasma density and potential profiles are presented to visualize peripheral-plasma ignition. A dielectric gap size is an important parameter for a dense and stable plasma source. | - |
| dc.description.statementofresponsibility | X | - |
| dc.language | English | - |
| dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGI | - |
| dc.relation.isPartOf | IEEE TRANSACTIONS ON PLASMA SCIENCE | - |
| dc.subject | capacitive coupled plasma (CCP) | - |
| dc.subject | modeling | - |
| dc.subject | peripheral plasma | - |
| dc.title | Ignition of peripheral plasma in capacitive discharges | - |
| dc.type | Article | - |
| dc.contributor.college | 전자전기공학과 | - |
| dc.identifier.doi | 10.1109/TPS.2008.922466 | - |
| dc.author.google | Kim, GJ | - |
| dc.author.google | Lee, SH | - |
| dc.author.google | Lee, JK | - |
| dc.relation.volume | 36 | - |
| dc.relation.issue | 4 | - |
| dc.relation.startpage | 1392 | - |
| dc.relation.lastpage | 1393 | - |
| dc.contributor.id | 10158178 | - |
| dc.relation.journal | IEEE TRANSACTIONS ON PLASMA SCIENCE | - |
| dc.relation.index | SCI급, SCOPUS 등재논문 | - |
| dc.relation.sci | SCI | - |
| dc.collections.name | Journal Papers | - |
| dc.type.rims | ART | - |
| dc.identifier.bibliographicCitation | IEEE TRANSACTIONS ON PLASMA SCIENCE, v.36, no.4, pp.1392 - 1393 | - |
| dc.identifier.wosid | 000258618200266 | - |
| dc.date.tcdate | 2019-01-01 | - |
| dc.citation.endPage | 1393 | - |
| dc.citation.number | 4 | - |
| dc.citation.startPage | 1392 | - |
| dc.citation.title | IEEE TRANSACTIONS ON PLASMA SCIENCE | - |
| dc.citation.volume | 36 | - |
| dc.contributor.affiliatedAuthor | Lee, JK | - |
| dc.identifier.scopusid | 2-s2.0-50249110185 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
| dc.description.wostc | 1 | - |
| dc.type.docType | Article | - |
| dc.subject.keywordAuthor | capacitive coupled plasma (CCP) | - |
| dc.subject.keywordAuthor | modeling | - |
| dc.subject.keywordAuthor | peripheral plasma | - |
| dc.relation.journalWebOfScienceCategory | Physics, Fluids & Plasmas | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Physics | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.