Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement
SCIE
SCOPUS
- Title
- Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement
- Authors
- Chen, YT; Lo, TN; Chu, YS; Yi, J; Liu, CJ; Wang, JY; Wang, CL; Chiu, CW; Hua, TE; Hwu, Y; Shen, Q; Yin, GC; Liang, KS; Lin, HM; Je, JH; Margaritondo, G
- Date Issued
- 2008-10-01
- Publisher
- IOP PUBLISHING LTD
- Abstract
- The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.
- Keywords
- E-BEAM LITHOGRAPHY; ZONE PLATES; FABRICATION; RESOLUTION
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/22558
- DOI
- 10.1088/0957-4484/19/39/395302
- ISSN
- 0957-4484
- Article Type
- Article
- Citation
- NANOTECHNOLOGY, vol. 19, no. 39, 2008-10-01
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- There are no files associated with this item.
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