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Design and measurement of nanopatterns for FIB reliability assessments SCIE SCOPUS

Title
Design and measurement of nanopatterns for FIB reliability assessments
Authors
Kang, HWCho, DW
Date Issued
2007-05
Publisher
ELSEVIER SCIENCE BV
Abstract
Focused ion beam (FIB) systems are one of the most important pieces of equipment in nanoscale machining, and can etch material and deposit 3-D nanoscale structures with high aspect ratios. However, despite considerable research effort, a definitive method for evaluating the reliability of FIB systems had not been developed. In this paper, we propose a reliability assessment method that utilizes fabricated nanopatterns. Since the characteristics of a FIB system are included in the nanopatterns, these can be used to assess its reliability. We suggest items and nanopatterns that can be applied to the reliability assessment tests. To determine the suitability of the proposed method, we fabricated several nanopatterns using different FIB systems and measured them under a scanning electron microscope to compare the actual and designed dimensions. The results showed that the proposed method is suitable for assessing the reliability of FIB systems. (c) 2007 Elsevier B.V. All rights reserved.
Keywords
focused ion beam; nanopatterns; reliability assessment; HIGH-RESOLUTION; ION
URI
https://oasis.postech.ac.kr/handle/2014.oak/23351
DOI
10.1016/j.mee.2007.01.029
ISSN
0167-9317
Article Type
Article
Citation
MICROELECTRONIC ENGINEERING, vol. 84, no. 5-8, page. 818 - 821, 2007-05
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조동우CHO, DONG WOO
Dept of Mechanical Enginrg
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