Nanolayer patterning based on surface modification with extreme ultraviolet light

Abstract

Chlorine nanolayers can be modified by extreme UV (EUV) irradiation, which can be applied to the fabrication of various surface functional-group patterns (see igure) owing to the striking contrast in reactivity between EUV-exposed and -unexposed regions. The technique provides flexibility of surface functionalization and may be applicable to the manufacture of electronic, photonic, and biomolecular nanodevices.