DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, KH | - |
dc.contributor.author | Jeon, CM | - |
dc.contributor.author | Oh, SH | - |
dc.contributor.author | Lee, JL | - |
dc.contributor.author | Park, CG | - |
dc.contributor.author | Lee, JH | - |
dc.contributor.author | Lee, KS | - |
dc.contributor.author | Koo, YM | - |
dc.date.accessioned | 2016-04-01T02:15:07Z | - |
dc.date.available | 2016-04-01T02:15:07Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2005-01 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.other | 2005-OAK-0000004902 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/24755 | - |
dc.description.abstract | An AlGaN/GaN wide band-gap semiconductor. with the Ta/Ti/Al/Ni/Au ohmic contact (7.5 x 10(-7) Omega cm(2)) was demonstrated by 700 degreesC annealing for 1 min. High-resolution electron microscopy and synchrotron-radiation x-ray diffraction showed that nitride phases were formed at the interface between the metal and the AlGaN layer. The thick formation of TaN/TiN interfacial layers appears to be responsible for the good ohmic contact behavior in Ta/Ti/Al/Ni/Au metal scheme. The surface morphology of Ta-based contacts is superior to that of the Ti/Al/Ni/Au metal scheme, The fabricated heterostructure field-effect transistor exhibited the saturation drain current density of 605 mA/mm and transconductance of 246 mS/mm. (C) 2005 American Vacuum Society. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | A V S AMER INST PHYSICS | - |
dc.relation.isPartOf | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.title | Investigation of Ta/Ti/Al/Ni/Au ohmic contact to AlGaN/GaN heterostructure field-effect transistor | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1116/1.1856479 | - |
dc.author.google | Kim, KH | - |
dc.author.google | Jeon, CM | - |
dc.author.google | Oh, SH | - |
dc.author.google | Lee, JL | - |
dc.author.google | Park, CG | - |
dc.author.google | Lee, JH | - |
dc.author.google | Lee, KS | - |
dc.author.google | Koo, YM | - |
dc.relation.volume | 23 | - |
dc.relation.issue | 1 | - |
dc.relation.startpage | 322 | - |
dc.relation.lastpage | 326 | - |
dc.contributor.id | 10105416 | - |
dc.relation.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.23, no.1, pp.322 - 326 | - |
dc.identifier.wosid | 000227300900058 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.endPage | 326 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 322 | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.volume | 23 | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.contributor.affiliatedAuthor | Park, CG | - |
dc.contributor.affiliatedAuthor | Koo, YM | - |
dc.identifier.scopusid | 2-s2.0-29044436362 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 22 | - |
dc.description.scptc | 23 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | N-GAN | - |
dc.subject.keywordPlus | ELECTRON-MICROSCOPY | - |
dc.subject.keywordPlus | GATE-LENGTH | - |
dc.subject.keywordPlus | RESISTANCE | - |
dc.subject.keywordPlus | PERFORMANCE | - |
dc.subject.keywordPlus | HEMTS | - |
dc.subject.keywordPlus | MICROSTRUCTURE | - |
dc.subject.keywordPlus | MODFETS | - |
dc.subject.keywordPlus | HFETS | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Physics | - |
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